Quadrupole Calibration

The quadrupole deflects the electron beam in a raster over a 64-fim square field. Because the quadrupole field of view is small, the corresponding electron optical aberrations are negligible, so three simplifying assumptions may be made The behavior of the quadrupole is independent of the octopole deflection Quadrupole deflection causes no growth in beam diameter, and The relationship between applied voltage and quadrupole deflection is linear. Fig. 4 is a simplified view of the quadrupole and...

Blanker System

The blanker system provides the high-speed intensity modulation of the electron beam necessary to write patterns as the beam is moved across the wafer or mask in a rasterscan fashion, The blanking system is composed of three main parts the blanker amplifier, the interconnect stripline, and the blanker deflection plates. The blanking is accomplished by deflecting the beam into a knife-edge, The deflection center is placed at a focal point of the final lens so that, ideally, no motion occurs at...

Operator Console

The operator console is the interface between the operator and the system when it is run as a scanning electron microscope. Inside the console are IO. control and front-panel sections that monitor front-panel buttons and Ron Scudder has been involved with the software and electronics of HP's ' electron beam system since 1974. serving as designer, project manager and now department manager He's been 1 with HP Laboratories since 1973 and has also helped develop an acoustically tuned Optical...

Octopole Calibration

The octopole deflector deflects the electron beam within a field that may be as large as 5 mm square. Within this area, the placement of the beam must be within 0.07 ,um of its required position, and its diameter must be maintained at 0.5 u.m or less. Calibration of the octopole is necessary to fulfill these requirements. To a close approximation, octopole deflection is a linear function of applied voltage, and the maximum error due to n on linear ties is about 2 m over a 5-nun-square field of...

By Earl E Lindberg and Charles L Merja

Friction Lead Screw

Crucai to the performance of an electron beam lithography system is the accuracy with which the substrate to be exposed can be positioned relative to the area scanned by the beam. High accuracy requires an X-Y stage that can be precisely located and a pallet that permits mounting the substrate r- a stable and re-peatabie fashion. The stage oerforms the step-and-repeat function of the e-ectron beam system by positioning he mask or wafer for each field of exposure of the column The stage...

By John C Eidson Wayne C Haase and Ronald K Scudder

THE INITIAL OBJECTIVE of HP's electron beam project was to build a precision high-speed direct writing electron beam lithography system that would be usable in a production environment. Later, a requirement was added that the system function as a mask maker. The system architecture and specifications were determined based on the results of experiments on field emission guns and numerous calculations md experiments on column design. The most significant of these results was that it appeared...